Home » Nanofabrication » Electron-beam Lithography » Leica VB6 UHR
The Leica VB6 UHR electron beam lithography machine is used for nanoscale patterning of semiconductor structures. This state-of-the-art system uses an electron beam of diameter 4nm and energy up to 100kV. It is capable of patterning substrates of up to 200mm diameter with a resolution as high as 10nm. This instrument is used to produce samples for a wide variety of academic and industrial users.
The Leica VB6 UHR electron beam lithography machine is used for nanoscale patterning of semiconductor structures. This state-of-the-art system uses an electron beam of diameter 4nm and energy up to 100kV. It is capable of patterning substrates of up to 200mm diameter with a resolution as high as 10nm. This instrument is used to produce samples for a wide variety of academic and industrial users.
Contact us for further information.
Contact us for further information.
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Turn around time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.
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