Dedicated laminar flow wet benches for work with solvents and water-based reagents. Oxygen- and water-sensitive materials processed in gloveboxes with inert gas inside. Thin film patterning of electrodes to create organic semiconductor devices.
Dedicated laminar flow wet benches for work with solvents and acids. Wet etching and cleaning of samples, ranging in size from chips upto 4″ wafers. This includes using hydrofluoric acid (HF) and piranha for etching/cleaning.
We offer several gloveboxes with oxygen- and water-free environment (nitrogen) for performing a wide range of processes.
We have a dedicated photolithography and metal evaporation equipment for complementary preparation of device electrodes.
Organic coatings patterning by specific techniques such as inkjet printing and laser ablation.
Whether you are new to the National Facility or have visited us before, our Getting Access page contains more information about booking our services.
Turnaround time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.
For pricing details and more information about the services we can provide please contact us.
We’re happy to help; please contact us using the form above. Or try our searchable equipment directory for an overview of everything CORDE has to offer.