Wet processing

Brief description

Dedicated laminar flow wet benches for work with solvents and acids. Wet etching and cleaning of samples, ranging in size from chips upto 4″ wafers. This includes using hydrofluoric acid (HF) and piranha for etching/cleaning. 

 

Wet processing

Brief description

Dedicated laminar flow wet benches for work with solvents and acids. Wet etching and cleaning of samples, ranging in size from chips upto 4″ wafers. This includes using hydrofluoric acid (HF) and piranha for etching/cleaning. 

Applications and uses

Wet etching provides a simple and cost-effective method of pattern transfer into substrates – but offers limited control over the etch profile. 

Components and further details

We offer wet etch and cleaning in dedicated laminar flow wetbenches, or fume cupboards where appropriate.

Compatibility

  • Acid etching for most compound semiconductor materials
  • Piranha and RCA cleaning
  • Hydrofluoric acid etching/cleaning
  • Ultrasonic cleaners 
  • Heated water baths

Usage restrictions

Not applicable

Booking

Whether you are new to the National Facility or have visited us before, our Getting Access page contains more information about booking our services. 

Availability and lead times

Turnaround time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.

Pricing

For pricing details and more information about the services we can provide please contact us.

Enquire about this instrument

If you are new to CORDE we would recommend contacting us via the form below to ensure we can help you with a detailed response. Or you can contact the team directly at nanofab@phy.cam.uk.

Not found what you’re looking for?

We’re happy to help; please contact us using the form above. Or try our searchable equipment directory for an overview of everything CORDE has to offer.