Dedicated laminar flow wet benches for work with solvents and acids. Wet etching and cleaning of samples, ranging in size from chips up to 4″ wafers. This includes using hydrofluoric acid (HF) and piranha for etching/cleaning.
Dedicated laminar flow wet benches for work with solvents and acids. Wet etching and cleaning of samples, ranging in size from chips upto 4″ wafers. This includes using hydrofluoric acid (HF) and piranha for etching/cleaning.
Wet etching provides a simple and cost-effective method of pattern transfer into substrates – but offers limited control over the etch profile.
We offer wet etch and cleaning in dedicated laminar flow wetbenches, or fume cupboards where appropriate.
Acid etching for most compound semiconductor materials
Piranha and RCA cleaning
Hydrofluoric acid etching/cleaning
Ultrasonic cleaners
Heated water baths
Not applicable
Whether you are new to the National Facility or have visited us before, our Getting Access page contains more information about booking our services.
Turnaround time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.
For pricing details and more information about the services we can provide please contact us.
We’re happy to help; please contact us using the form above. Or try our searchable equipment directory for an overview of everything CORDE has to offer.