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An Electron-beam Lithography system with a thermal field emission gun for operation at 100 kV, and a high KV for high aspect ratio nanostructures, including high speed direct write with full automatization. It has one of the fastest Gaussian Beam system on the market, with fast, arbitrary shape pattern generator of 100MHz. It can process 200 mm (8 inch) wafers and 7 inch masks with a minimum feature size less than 8 nm. The precise overlay of features size is less than 10nm and is the fastest tool for “high density” patterns.
An Electron-beam Lithography system with a thermal field emission gun for operation at 100 kV, and a high KV for high aspect ratio nanostructures, including high speed direct write with full automatization. It has one of the fastest Gaussian Beam system on the market, with fast, arbitrary shape pattern generator of 100MHz. It can process 200 mm (8 inch) wafers and 7 inch masks with a minimum feature size less than 8 nm. The precise overlay of features size is less than 10nm and is the fastest tool for “high density” patterns.
Contact us for further information.
Fully operational
Whether you are new to the National Facility or have visited us before, our Getting Access page contains more information about booking our services.
Turn around time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.
For pricing details and more information about the services we can provide please contact us.
If you are new to CORDE we would recommend contacting us via the form below to ensure we can help you with a detailed response. Or you can contact the team directly at ebeam@phy.cam.uk.
We’re happy to help; please contact us using the form above. Or try our searchable equipment directory for an overview of everything CORDE has to offer.
