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The Leica VB6 UHR electron beam lithography machine is used for nanoscale patterning of semiconductor structures. This state-of-the-art system uses an electron beam of diameter 4nm and energy up to 100kV. It is capable of patterning substrates of up to 200mm diameter with a resolution as high as 10nm. This instrument is used to produce samples for a wide variety of academic and industrial users.
The Leica VB6 UHR electron beam lithography machine is used for nanoscale patterning of semiconductor structures. This state-of-the-art system uses an electron beam of diameter 4nm and energy up to 100kV. It is capable of patterning substrates of up to 200mm diameter with a resolution as high as 10nm. This instrument is used to produce samples for a wide variety of academic and industrial users.
Contact us for further information.
Contact us for further information.
Fully operational
Whether you are new to the National Facility or have visited us before, our Getting Access page contains more information about booking our services.
Turn around time is generally from one week, although this could be faster or slower depending on the work package; please contact us for more details.
For pricing details and more information about the services we can provide please contact us.
If you are new to CORDE we would recommend contacting us via the form below to ensure we can help you with a detailed response. Or you can contact the team directly at ebeam@phy.cam.uk.
We’re happy to help; please contact us using the form above. Or try our searchable equipment directory for an overview of everything CORDE has to offer.
