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Leica VB6 UHR Leica VB6 UHR Brief description The Leica VB6 UHR electron beam lithography machine is used for nanoscale patterning of semiconductor structures. This state-of-the-art system uses an electron beam of diameter 4nm and energy up to 100kV. It is capable of patterning substrates of up to 200mm diameter with a resolution as high […]
RAITH – EBPG 5200 Brief description An Electron-beam Lithography system with a thermal field emission gun for operation at 100 kV, and a high KV for high aspect ratio nanostructures, including high speed direct write with full automatization. It has one of the fastest Gaussian Beam system on the market, with fast, arbitrary shape pattern […]
Electron-beam Lithography Provides services for the fabrication of devices by electron beam lithography, patterning silicon wafers with feature sizes ranging from hundreds of micrometers down to 8nm. Key features: Two electron beam lithography machines, essential manufacturing tools for fabrication of deep nanoscale devices. Contributes to developing novel nanoelectronic devices, on-chip integrated optoelectronic circuits, quantum devices, […]
